Tailoring phase and composition at the nanoscale: Atomic layer deposition of Zn-Ti-O thin films

Different Zn-Ti-O phases were prepared with high reproducibility in the form of very thin films (thickness: 40 nm) by alternating atomic layer deposition cycles of TiO(2) and ZnO precursors at 90 degrees C, followed by annealing at 600 degrees C. This procedure enables a very fine control of stoichiometry and the achievement of unexpected zinc titanate phases.